Semiconductor capacitor with praseodymium oxide as dielectric

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United States of America Patent

PATENT NO 7113388
APP PUB NO 20050168915A1
SERIAL NO

10511777

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Abstract

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In accordance with the invention there is provided a semiconductor capacitor having a first semiconductor layer which forms a first capacitor electrode and which includes silicon, a second capacitor electrode and a capacitor dielectric including praseodymium oxide between the capacitor electrodes, in which provided between the capacitor dielectric including praseodymium oxide and at least the first semiconductor layer including silicon is a first thin intermediate layer representing a diffusion barrier for oxygen. In particular the thin intermediate layer can include oxynitride.

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Patent Owner(s)

Patent OwnerAddress
IHP GMBH - INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS/INSTITUTE FUR INNOVATIVE MIKROELECKTRONIKIM TECHNOLOGIEPARK 25 D-15236 FRANKFURT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mussig, Hans-Joachim Dresden, DE 5 9

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