Method of inspecting pattern and inspecting instrument
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United States of America Patent
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Sep 26, 2006
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N/A
app pub date -
Aug 12, 2004
filing date -
Dec 2, 1999
priority date (Note) -
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Abstract
A sample inspection system having a sample stage holding a sample to be inspected, electron beam optics so as to radiate an electron beam to the sample, a detector unit that detects a secondly generated signal generated in response to radiation of the sample by the electron beam, a storage for storing a plurality of images obtained from the generated signal and information for classifying the plurality of images by a type of defect in the sample, and an image processing unit. The image processing unit retrieves any of the plurality of images and classifies the retrieved image depending on the type of defect including an electrical defect and a defect in the figure.
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