Method of forming a liquid crystal display

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United States of America Patent

PATENT NO 7112458
SERIAL NO

10605499

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Abstract

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An active layer of a P-type low temperature polysilicon thin film transistor and a bottom electrode of a storage capacitor are first formed. Then, a P-type source/drain is formed and the bottom electrode is doped with dopants. A gate insulator, a gate electrode, a capacitor dielectric, and a top electrode are thereafter formed. Finally, a source interconnect, a drain interconnect, and a pixel electrode of the liquid crystal display are formed.

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Patent Owner(s)

Patent OwnerAddress
INNOLUX CORPORATIONNO 160 KESYUE RD JHU-NAN SITE HSINCHU SCIENCE PARK JHU-NAN MIAO-LI COUNTY 350

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lin, Gwo-Long Hsin-Chu, TW 11 78
Lu, I-Min Taipei, TW 34 109
Shih, Chu-Jung Taipei, TW 16 96

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