Water-based resist stripping liquid management apparatus and water-based resist stripping liquid management method
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United States of America Patent
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Sep 19, 2006
Grant Date -
Dec 26, 2002
app pub date -
Jun 25, 2002
filing date -
Jun 25, 2001
priority date (Note) -
Expired
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Abstract
The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
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