Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element

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United States of America Patent

PATENT NO 7102732
APP PUB NO 20030206283A1
SERIAL NO

10425369

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Abstract

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Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.

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Patent Owner(s)

Patent OwnerAddress
AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE LIMITED1 YISHUN AVENUE 7 SINGAPORE 768923

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bleeker, Arno Jan Westerhoven, NL 99 3022
de, Jager Pieter Willem Herman Rotterdam, NL 85 1247
Kruit, Pieter Delft, NL 103 1318
van, der Mast Karel Diederick Helmond, NL 28 879

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