Photosensitive resin compositions
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United States of America Patent
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Sep 5, 2006
Grant Date -
Dec 9, 2004
app pub date -
Mar 9, 2004
filing date -
Mar 11, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
New photosensitive PBO precursor polymers which contain diazoquinone moieties attached to its backbone and in which all amino end groups are converted into amide groups. The photosensitive formulation based on the disclosed PBO precursor polymers have good imaging and mechanical properties as well as superior shelf life stability.Photosensitive polybenzoxazole precursor polymers having (sulfon)amide end groups (with or without attached diazoquinone groups) can be formulated into photosensitive compositions with diazoquinone photoactive compounds which lack benzylic hydrogens on the backbone to yield compositions producing films significantly lighter in color after curing.
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