Photomask assembly and method for protecting the same from contaminants generated during a lithography process
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United States of America Patent
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Aug 22, 2006
Grant Date -
Jul 15, 2004
app pub date -
Oct 29, 2003
filing date -
Oct 29, 2002
priority date (Note) -
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Abstract
A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.
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