Lithography-based patterning of layer-by-layer nano-assembled thin films
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United States of America Patent
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Aug 15, 2006
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N/A
app pub date -
Mar 13, 2003
filing date -
Mar 13, 2003
priority date (Note) -
Expired
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Abstract
A method of patterning self-assembled thin films, including forming a photoresist layer on a substrate and then patterning and etching the photoresist layer. In combination with the etched photoresist layer, a self-assembled layer is formed on the substrate using LbL self-assembly.
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