Combined coating process comprising magnetic field-assisted, high power, pulsed cathode sputtering and an unbalanced magnetron
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United States of America Patent
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Jul 25, 2006
Grant Date -
May 26, 2005
app pub date -
Nov 20, 2003
filing date -
Nov 20, 2003
priority date (Note) -
Expired
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Abstract
A PVD process for coating substrates, wherein the substrate is pre-treated in the vapor of a pulsed, magnetic field-assisted cathode sputtering operation, and during pre-treatment a magnetic field arrangement of the magnetron cathode type, with a strength of the horizontal component in front of the target of 100 to 1500 Gauss, is used for magnetic field-assistance, and after pre-treatment further coating is effected by means of cathode sputtering and the power density of the pulsed discharge during pre-treatment is greater than 1000 W.cm.sup.-2.
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