Matching dose and energy of multiple ion implanters
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United States of America Patent
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Jul 18, 2006
Grant Date -
Aug 18, 2005
app pub date -
Feb 13, 2004
filing date -
Feb 13, 2004
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Abstract
A method that is sensitive to lattice damage (also called 'primary method') is combined with an additional method that independently measures one of two parameters to which the primary method is sensitive namely dose and energy. In some embodiments, the additional method is sensitive to dose, and in two such embodiments 4PP and SIMS are respectively used to measure dose (independent of energy). In other embodiments, the additional method is sensitive to energy, and in one such embodiment SIMS is used to measure energy (independent of dose). Use of such an additional method resolves an ambiguity in a prior art measurement by the primary method alone. The two methods are used in combination in some embodiments, to determine adjustments needed to match two or more ion implanters to one another or to a reference ion implanter or to a computer model.
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