Correction of birefringence in cubic crystalline optical systems
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United States of America Patent
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Jul 11, 2006
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N/A
app pub date -
Oct 18, 2005
filing date -
Jun 1, 2001
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Abstract
A lithographic apparatus includes a projection system, which includes a plurality of cubic crystalline optical elements that each impart retardance to a beam of radiation. The optical elements are aligned along an optical axis of the projection system and include two adjacent crystalline optical elements having a common crystalline lattice direction oriented along the optical axis. A first of the two adjacent elements is rotated about the optical axis with respect to a second of the adjacent elements with a predetermined rotation angle. The crystalline optical elements are selected and positioned along the optical axis and the rotation angle is selected such that, for each of two substantially perpendicular polarization states of the beam of radiation having a radiation wavelength of about 193 nm, the patterned beam of radiation has less than about 0.012 waves RMS of wavefront aberration across an exit pupil of the projection system.
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