Projection exposure apparatus with line width calculator controlled diaphragm unit
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United States of America Patent
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-
Jul 11, 2006
Grant Date -
Oct 4, 2001
app pub date -
Mar 27, 2001
filing date -
Mar 30, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A projection exposure apparatus includes a diaphragm controlling unit controlling one or more of an diaphragm, an iris diaphragm, and a relay lens system. In addition, the projection exposure apparatus also includes a line width calculator which calculates a bias, which is a difference between a line width in a dense part and a line width in an isolated part, based on information regarding a mask pattern, the wavefront aberration of a lens, the effective light source of an illumination optical system, the half-width of a laser, the temperature change in a projection optical system due to exposure, etc. When the bias is out of a tolerance range, the line width calculator calculates a correction value for the diaphragm of the projection optical system or a correction value for the effective light source of the illumination optical system in accordance with the bias which is to be corrected. Then, the diaphragm controlling unit is driven in accordance with the calculation results.
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