Multivariate statistical process monitors

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United States of America Patent

PATENT NO 7062417
APP PUB NO 20020072882A1
SERIAL NO

09815274

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Abstract

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An extended partial least squares (EPLS) approach for the condition monitoring of industrial processes is described. This EPLS approach provides two statistical monitoring charts to detect abnormal process behaviour as well as contribution charts to diagnose this behaviour. A theoretical analysis of the EPLS monitoring charts is provided, together with two application studies to show that the EPLS approach is either more sensitive or provides easier interpretation than conventional PLS.Generalised scores are calculated by constructing an augmented matrix, of the form Z=[Y{dot over (:)}X], where X is the predictor matrix and Y is the response matrix, and constructing a score matrix T.sub.n=T*.sub.n-E*.sub.n in which T*.sub.n and E*.sub.n are generally of the form:.times..times..times..times..function..times..times..times..time-s..times..function..times. ##EQU00001## the columns of the matrix T*.sub.n providing the generalised t-scores and the columns of the matrix E*.sub.n the generalised residual scores, where I denotes an M.times.M identity matrix, B.sub.PLS.sup.(n) is the PLS regression matrix.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Qian Nanjing, CN 416 1749
Kruger, Uwe Belfast, GB 13 85
Sandoz, David J Gwynedd, GB 2 70

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