Photomask and method for manufacturing the same
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United States of America Patent
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Jun 6, 2006
Grant Date -
Jul 24, 2003
app pub date -
Jan 24, 2003
filing date -
Jan 24, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A photomask and method for manufacturing the same are disclosed. A first material is deposited on at least a portion of a substrate to form a first material layer. Before completion of the deposition of the first material, a thermal treatment is applied to the substrate at a temperature greater than approximately 300 degrees Celsius.
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