Method of producing a nanotube layer on a substrate
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United States of America Patent
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Apr 25, 2006
Issued Date -
N/A
app pub date -
Mar 20, 2002
filing date -
Sep 29, 1999
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Expired
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Abstract
In a method of producing a nanotube layer on a substrate by using a CVD process, the substrate is placed in a reaction chamber, which is flushed with a carbon-containing gas. Subsequently, the substrate is heated by an induction process to a temperature at which carbon from the gas phase is deposited on the substrate while forming nanotubes thereon.
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