Method of developing a resist film and a resist development processor
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United States of America Patent
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Apr 25, 2006
Grant Date -
May 20, 2004
app pub date -
Nov 13, 2003
filing date -
Nov 19, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
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