Attenuating phase shift mask blank and photomask

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7029803
APP PUB NO 20050053845A1
SERIAL NO

10655593

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present invention relates to attenuating phase shift mask blanks for use in lithography, a method of fabricating such a mask blank.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SCHOTT AG55122 MAINZ

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Becker, Hans Meiningen, DE 42 668
Buttgereit, Ute Zella-Mehlis, DE 13 238
Chey, S Jay Ossining, NY 36 714
Goetzberger, Oliver Meiningen, DE 6 188
Hess, Gunter Meiningen, DE 12 133
Renno, Markus Meiningen, DE 10 257
Schmidt, Frank Jena, DE 173 1805
Sobel, Frank Meiningen, DE 11 251

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation