Adjustment in a MAPPER system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 28, 2006
Grant Date -
Mar 18, 2004
app pub date -
Jun 20, 2003
filing date -
Jun 20, 2002
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention relates to a lithography system comprising: means for generating a plurality of light beamlets, and an electron source, arranged to be illuminated by said light beamlets, said electron source comprising a plurality of converter elements at an element distance from each other for converting a light beamlet impinging onto it into an electron beamlet directed towards and focussed on an object plane,
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully