Reticle focus measurement system using multiple interferometric beams

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United States of America Patent

PATENT NO 7016051
SERIAL NO

10965026

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Abstract

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A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.

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Patent Owner(s)

Patent OwnerAddress
ASML HOLDING N VNETHERLANDS GELEEN LIMBURG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bednarek, Todd J Southbury, CT 4 22
Roux, Stephen New Fairfield, CT 51 544

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