Iron-nickel alloy material for shadow mask with excellent suitability for etching
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United States of America Patent
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Mar 21, 2006
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app pub date -
Nov 20, 2001
filing date -
Nov 21, 2000
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Abstract
The invention is a Fe—Ni alloy material comprising Ni: 26-37 wt %, Si: 0.001-0.2 wt %, Mn: 0.01-0.6 wt %, Al: 0.0001-0.003 wt %, Mg: not more than 0.001 wt %, Ca: not more than 0.001 wt % and the reminder being Fe and inevitable impurities, and containing not more than 0.02 wt % of one or more MnO—SiO2—Al2O3 inclusion, SiO2 inclusion and MgO—Al2O3 inclusion insoluble in an aqueous solution of ferric chloride, and is to provide electronic materials for shadow mask and the like having a good hole shape in an etching treatment and a high quality.
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