Processes for producing polysiloxanes and photoresist compositions comprising same
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United States of America Patent
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Mar 7, 2006
Grant Date -
Dec 4, 2003
app pub date -
Mar 3, 2003
filing date -
Mar 3, 2002
priority date (Note) -
Expired
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Abstract
New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.
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