Method of symmetrically locating a pattern piece relative to work material having a variable repeat pattern
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United States of America Patent
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Feb 21, 2006
Grant Date -
Mar 24, 2005
app pub date -
Sep 23, 2004
filing date -
Sep 23, 2003
priority date (Note) -
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Abstract
A method for symmetrically aligning a pattern piece relative to a work material defining a pattern with varying repeat dimensions. The method including selectively capturing first and second images of areal portions of the work material corresponding to respective first and second reference points on said pattern piece, displaying the first and second images adjacent one another, and moving the pattern displayed in one of the first and second images an adjustment distance, such that the pattern defined by the work material is substantially aligned with respect to first and second images. The position of the pattern piece is then moved relative to the work material proportional to the adjustment distance so that the first and second reference points are symmetrically aligned with respect to the repeating pattern. The images can also be rotated about an axis substantially perpendicular to or parallel with the plane of the work material.
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