Material characterization system

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United States of America Patent

PATENT NO 6992286
APP PUB NO 20040183012A1
SERIAL NO

10792781

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An electron beam device is provided with an electron beam diffraction image analysis section for calculation of the lattice distance from the diffraction image taken into by the TV camera for observation of the electron beam diffraction image, the EDX analysis section for acquiring a composition of the material, the data base for retrieval of material characterization, and the material characterization section having the data base retrieval function. The material characterization section characterizes the material by retrieving the retrieval data base, based upon the lattice distance data transferred from the electron beam diffraction image analysis section and the element data transferred from the EDX analysis sectio.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECHNOLOGIES CORPORATION24-14 NISHI SHIMBASHI 1-CHOME MINATO-KU TOKYO 1058717 ?1058717
HITACHI SCIENCE SYSTEMS LTDHITACHINAKA-SHI IBARAKI-KEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kamino, Takeo Hitachinaka, JP 9 135
Taniguchi, Yoshifumi Hitachinaka, JP 28 261
Yaguchi, Toshie Higashiibaraki, JP 22 193

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