Polymers with mixed photoacid-labile groups and photoresists comprising same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 24, 2006
Grant Date -
Jan 1, 2004
app pub date -
Oct 9, 2002
filing date -
Oct 9, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully