Substrate treatment process and apparatus
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United States of America Patent
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Jan 10, 2006
Issued Date -
N/A
app pub date -
Apr 20, 2004
filing date -
Dec 24, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A substrate treatment apparatus comprises a treatment vessel, a substrate holder for rotating the substrate in a horizontal plane in the treatment vessel, a nozzle unit arranged in an upper part of the treatment vessel such that a liquid is downwardly fed, a feed line for feeding the liquid to the nozzle unit, and a chamber enclosing therein the apparatus in its entirety. The nozzle unit is constructed in a form of a bar such that as viewed in plan, the liquid ejected from the nozzle unit reaches the substrate with an area range having a length not smaller than a diameter of the substrate and a width smaller than the diameter of the substrate.
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