Exhaust valve for semiconductor manufacturing process
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United States of America Patent
Stats
-
Jan 3, 2006
Grant Date -
Aug 26, 2004
app pub date -
Feb 18, 2004
filing date -
Feb 20, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The Invention relates to an exhaust valve for a semiconductor manufacturing process, which can improve sealability of the exhaust valve, prevent leakage of exhaust gas, and increase the cleaning period, more concretely, The exhaust valve includes a valve body having a chamber formed at the center thereof; a rotary cylinder rotatably coupled to the chamber of the valve body; a protective cover coupled to the outer circumferential surface of the rotary cylinder; an exhaust guide member coupled to the lower portion of the valve body; an adapter seated on the upper portion of the valve body and surrounding the shaft portion of the rotary cylinder; an actuator coupled to the upper portion of the adapter for rotating the rotary cylinder; and sensing means mounted at the upper portion of the valve body, wherein a first sealing member is mounted between the rotary cylinder and the protective cover.
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