Method for forming photo-defined micro electrical contacts
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United States of America Patent
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Dec 20, 2005
Grant Date -
Aug 12, 2004
app pub date -
Oct 24, 2003
filing date -
Sep 20, 2001
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Abstract
A method of manufacturing a probe test head for testing of semiconductor integrated circuits includes: defining shapes of a plurality of probes as one or more masks; a step for fabricating the plurality of probes using the mask; and disposing the plurality of probes through corresponding holes in a first die and a second die. The step for fabricating the plurality of probes may include one of photo-etching and photo-defined electroforming.
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