Thin film formation use sputtering target material, thin film formed using same, and optical recording medium

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United States of America Patent

PATENT NO 6972076
SERIAL NO

09429719

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An alloy material, a thin film and an optical recording medium to achieve various tasks such as maintenance of a high reflectivity, improved corrosion resistance, simplified production of the alloy, and realization of stability and simplicity/easiness of a sputtering process when being used as a sputtering target. An AgPd alloy including Ag as a main component and Pd in the range of 0.5 to 4.9 atomic % is used as a thin film formation use sputtering target material, with the target material a thin film, that is a reflecting film, constituting an optical recording medium is formed and the optical recording medium containing the reflecting film as a constituent is produced.

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Patent Owner(s)

Patent OwnerAddress
SONY CORPORATIONTOKYO
FURUYAMETALS CO LTDMSB-21 MINAMIOTSUKA BLDG 37-5 2-CHOME MINAMIOTSUKA TOSHIMA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aratani, Katsuhisa Chiba, JP 128 1644
Ueno, Takashi Tokyo, JP 164 1647

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