Method and system for automatically deriving stippling stitch designs in embroidery patterns
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United States of America Patent
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Nov 22, 2005
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N/A
app pub date -
Oct 27, 2004
filing date -
Oct 22, 2004
priority date (Note) -
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Abstract
The invention pertains to a method of applying a stippling stitch design to an area defining an asymmetrical polygon in a coordinate planar display format, involving: defining a pathway, which may be based on a fractal design, within a geometrically symmetrical boundary, the pathway comprising a single non-intersecting line; conforming the pathway to an asymmetrical polygon area substantially disposed within the geometrically symmetrical boundary; deriving a plurality of coordinate points representative of the pathway; and passing the points to a data storage medium in a pre-determined embroidery data format.
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