Automatic gas control system for a gas discharge laser
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United States of America Patent
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Nov 8, 2005
Grant Date -
Feb 5, 2004
app pub date -
Jan 31, 2003
filing date -
Aug 29, 2001
priority date (Note) -
Expired
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Abstract
An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.
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