Method and device for depositing in particular organic layers using organic vapor phase deposition
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United States of America Patent
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Nov 8, 2005
Issued Date -
N/A
app pub date -
Mar 28, 2003
filing date -
Sep 29, 2000
priority date (Note) -
Expired
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Abstract
The invention relates to a method and a device for depositing especially, organic layers. In a heated reactor, a non-gaseous starting material that is stored in a source in the form of a container is transported from said source to a substrate by a carrier gas in gaseous form and is deposited on said substrate. The rate of production of the gaseous starting material by the source is unpredictable due to a heat input that cannot be regulated in a reproducible manner and due to cooling resulting from the carrier gas. The invention therefore provides that the preheated carrier gas washes through the starting material from bottom to top, the starting material being kept essentially isothermal in relation to the carrier gas by the heated container walls.
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