Electromagnetic radiation generation using a laser produced plasma
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United States of America Patent
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Oct 18, 2005
Grant Date -
May 12, 2005
app pub date -
Aug 30, 2001
filing date -
Aug 31, 2000
priority date (Note) -
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Abstract
An extreme ultraviolet radiation generator is disclosed in which Xenon gas is continuously ejected from a high pressure nozzle into a low pressure chamber to generate Xenon atom clusters which are irradiated with a high repetition rate pulsed laser to form a plasma and yield quasi-continuous EUV generation. The nozzle has a beveled outer rim to enable the focus point of the laser light to be brought close to the nozzle. The nozzle is cooled to a temperature at which background Xenon gas condenses onto the nozzle forming a protective layer. A gas compressor serves to recirculate the Xenon gas and batch purification triggered by a mass spectrometer monitoring gas purity may be periodically applied.
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