Micro device and process for producing it
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United States of America Patent
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Oct 11, 2005
Grant Date -
Dec 30, 2004
app pub date -
Jul 30, 2003
filing date -
Jun 24, 2003
priority date (Note) -
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Abstract
A micro device comprising a SU-8 photoresist layer adhered to a thin layer of, for example, silicon nitride, silicon oxide, metal, and diamond. The SU-8 layer is clamped on the thin layer by using an under-etching technique.
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