Methods of forming integrated optoelectronic devices
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United States of America Patent
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Sep 13, 2005
Grant Date -
Jun 26, 2003
app pub date -
Dec 2, 2002
filing date -
Nov 12, 1999
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Abstract
Methods of forming optoelectronic devices include forming an electrically conductive layer on a first surface of a substrate and forming a mirror backing layer from the electrically conductive layer by forming an endless groove that extends through the electrically conductive layer. A step is then performed to remove a portion of the substrate at a second surface thereof, which extends opposite the first surface. This step exposes a front surface of the mirror backing layer. An optically reflective mirror surface is then formed on the front surface of the mirror backing layer.
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