Method of making photonic devices with SOG interlayer
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United States of America Patent
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Aug 30, 2005
Grant Date -
Sep 25, 2003
app pub date -
Mar 21, 2002
filing date -
Mar 21, 2002
priority date (Note) -
Expired
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Abstract
A method of making a photonic device having at least two layers formed over a substrate, preferably by plasma enhanced chemical vapor deposition, involves depositing a thin spin-on glass (SOG) interlayer between at least one adjacent pair of layers to improve the roughness characteristics.
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