Reticle focus measurement method using multiple interferometric beams
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United States of America Patent
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Aug 23, 2005
Grant Date -
Mar 11, 2004
app pub date -
Sep 6, 2002
filing date -
Sep 6, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.
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