Liquid material supply system and method for semiconductor manufacturing
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United States of America Patent
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Aug 23, 2005
Grant Date -
Nov 13, 2003
app pub date -
Mar 7, 2003
filing date -
Mar 13, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A liquid material supply system in which an inert gas is injected into a material tank accommodating a liquid material so as to discharge the liquid material into a liquid material discharge pipe connected to the material tank and that the inert gas dissolved or mixed in the discharged liquid material is trapped by a gas trap provided on the liquid material discharge pipe, is constructed in such a manner that when a dissolution temperature characteristic of the inert gas with respect to the liquid material is negative, an upstream side of the liquid material discharge pipe with respect to the gas trap is heated while the downstream side of the liquid material discharge pipe with respect to the gas trap is cooled.
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