Vacuum deposition of dielectric coatings on volatile material
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United States of America Patent
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Aug 23, 2005
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Apr 14, 2005
app pub date -
Oct 14, 2003
filing date -
Oct 14, 2003
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Abstract
In order to allow application of any coating under a vacuum over a volatile gelatinous layer, such as polymer dispersed liquid crystal (PDLC) on an optical glass substrate with a transparent electrode, such as indium tin oxide (ITO) on its surface, a layer of an intermediate stress absorbing polymeric material is first applied to cover the volatile gelatinous layer to prevent evaporation and escape of volatiles, thereafter the coating is applied under a very high vacuum using for example a technique called Physical Vapor Deposition (PVD) or sputtering.
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