COMBINED ABLATION AND EXPOSURE SYSTEM AND METHOD
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United States of America Patent
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Aug 23, 2005
Grant Date -
Aug 25, 2005
app pub date -
Apr 9, 2004
filing date -
Feb 25, 2004
priority date (Note) -
Granted
status (Latency Note)
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Abstract
An exposure system is provided that surrounds a photopolymer on a rotating cylinder ablation system. The exposure system linearly follows the ablation source and operates to expose the ablated (masked) plate with high intensity illumination from all sides so as to continuously expose all points on the photopolymer.
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