Fluorinated photopolymer composition and waveguide device
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United States of America Patent
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Aug 16, 2005
Grant Date -
Sep 26, 2002
app pub date -
Jan 18, 2002
filing date -
Jan 25, 2001
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Abstract
A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at least one multifunctional non-fluorinated (meth)acrylate and at least one photoinitiator. An optical coating on a variety of substrates is obtained by exposing the photosensitive composition to actinic radiation such as UV light. An optical waveguide device is fabricated by patterning the photosensitive composition on a substrate.
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