Method for recognizing and avoiding etch-critical regions
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United States of America Patent
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Aug 9, 2005
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app pub date -
Sep 28, 2000
filing date -
Sep 29, 1999
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Abstract
In a method for recognizing etch-critical regions, the critical regions are already determined in the layout under the processor control dependent on the fabrication-oriented rules and are automatically rectified in the existing layout, so that under-etchings are avoided in the following etching procedures.
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