Decomposition of fluorine containing compounds
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United States of America Patent
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Jul 26, 2005
Grant Date -
Apr 22, 2004
app pub date -
Jan 24, 2002
filing date -
Jan 24, 2001
priority date (Note) -
Expired
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Abstract
A process for the decomposition and removal of one or more fluorine containing compounds from a first gaseous mixture comprising the one or more fluorine containing compounds and water vapour, which process comprises the stages of: (i) contacting the first gaseous mixture with a catalyst comprising an aluminium based material to produce a second gaseous mixture comprising hydrogen fluoride and carbon oxides; and (ii) removing the hydrogen fluoride from the second gaseous mixture to produce a third gaseous mixture, which is substantially free of hydrogen fluoride.
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