Apparatus for producing synthetic quartz glass
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 26, 2005
Grant Date -
Oct 17, 2002
app pub date -
May 30, 2002
filing date -
Mar 7, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains ≧1150 ppm OH, a strain double refraction of ≦5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of ΔT ≦0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength λ1=248 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and lumination ≦10 mJ/cm2, and wavelength λ2=193 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and lumination 2. Apparatus for producing the preform comprises a horizontally positioned muffle with two different sized openings facing each other. The larger of the openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully