Direct write lithography system
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United States of America Patent
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Jul 19, 2005
Grant Date -
Nov 27, 2003
app pub date -
Mar 19, 2003
filing date -
Mar 19, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The mask-less lithography system has a converter that includes an array of light controllable electron sources. Each electron source is arranged for converting light into an electron beam and has an activation area. Individually controllable light sources are included where each light source is arranged for activating one electron source. A Controller controls each light source individually and each electron beam is focused on an object plane with a diameter smaller than the diameter of an individually controllable light source.
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