Rotational stage with vertical axis adjustment
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United States of America Patent
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-
Jul 12, 2005
Grant Date -
Nov 11, 2004
app pub date -
Jun 8, 2004
filing date -
Nov 1, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A stage system is disclosed for supporting and positioning a semiconductor wafer for inspection in an optical metrology device. A chuck for supporting a wafer is mounted to the stage system. The stage system can move the chuck along two linear orthogonal axes. A rotational stage is also provided for rotating the chuck. A mechanism is provided for adjusting the vertical position of a chuck to allow for focusing of the probe beam of the metrology device. The vertical adjustment mechanism is designed so that it does impede the rotational positioning of the chuck.
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