Reflective lithography mask inspection tool based on achromatic Fresnel optics
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United States of America Patent
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Jul 5, 2005
Grant Date -
Mar 25, 2004
app pub date -
Apr 29, 2003
filing date -
Nov 9, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.
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