Particle-optical apparatus, electron microscopy system and electron lithography system
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United States of America Patent
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Jul 5, 2005
Grant Date -
Jun 3, 2004
app pub date -
Aug 13, 2003
filing date -
Aug 13, 2002
priority date (Note) -
Expired
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Abstract
A particle-optical apparatus is provided for directing a beam of charged particles on an object plane or to image the object plane with the beam onto an image plane or intermediate image plane. The apparatus comprises a stack of lens assemblies which are disposed in beam direction at a fixed distances spaced apart from which other and are controllable for providing successively adjustable deflection fields for a beam traversing the stack. Each lens assembly provides at least one field source member for a magnetic or electric field. In particular, two rows of a plurality of field source members per lens assembly can be provided.
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