Photomask and method for qualifying the same with a prototype specification

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United States of America Patent

PATENT NO 6910203
APP PUB NO 20030198873A1
SERIAL NO

10314844

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Abstract

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A photomask and method for qualifying the same with a prototype specification are disclosed. The method includes comparing a plurality of die sites formed in a patterned layer on a photomask with a prototype specification. If at least one of the die sites complies with the prototype specification, the photomask is selected for used in a semiconductor manufacturing process.

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Patent Owner(s)

Patent OwnerAddress
TOPPAN PHOTOMASKS INC131 OLD SETTLERS BOULEVARD ROUND ROCK TX 78664

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kokjohn, Craig W Danville, CA 1 1

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