Photo-patternable mono-phase fluorinated organometallic sol-gels for integrated optics and methods of fabrication
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United States of America Patent
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Jun 21, 2005
Grant Date -
Feb 19, 2004
app pub date -
Aug 15, 2002
filing date -
Aug 15, 2002
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Abstract
A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [, R'; and R′'; are photo cross-linkable groups, and where (CH2)n are alkyl spacers with n being an integer ≧0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.
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