Method of manufacturing a device
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United States of America Patent
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Jun 7, 2005
Grant Date -
Jan 29, 2004
app pub date -
Jul 25, 2002
filing date -
Jul 25, 2002
priority date (Note) -
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Abstract
A method of manufacturing a device includes activating a gas containing at least one of hydrogen and of nitrogen by a hollow cathode discharge and exposing a first surface of a first material to the activated gas, thereby generating at the first surface an enrichment of at least one of hydrogen and of nitrogen and applying a further treatment to the enriched surface.
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